Origin of Tearing Paths in Transferred Graphene by H2 Bubbling Process and Improved Transfer of T ear-Free Graphene Films U sing a H eat Press

Among efforts to improve techniques for the chemical vapor deposition of large-area and high-quality graphene films on transition metal substrates, being able reliably transfer these atomistic membranes onto desired substrate is a critical step various practical uses, such as graphene-based electronic photonic devices. However, most used approach, wet etching process based complete remains great challenge. This mainly due inevitable damage graphene, unintentional contamination layer, increased production cost time. Here, we report systematic study an H2 bubbling-assisted technique grown Cu foils, which nondestructive not only film but also substrate. Also, demonstrate origin tearing phenomenon induced by this process. reveals that inherent features are produced rolling foil, cause saw-like corrugation in poly(methyl methacrylate) (PMMA)/graphene stack when it transferred target after foil dissolved. During PMMA removal stage, appears at apexes corrugated PMMA/graphene stack, weak adhesion To address this, have developed modified heat-press-assisted has much better control both formation residues films.